ASML has introduced a powerful new chipmaking machine called the High NA EUV scanner. Priced at $400 million, this advanced system is a major step forward in Extreme Ultraviolet (EUV) lithography technology.
The Dutch firm is the world’s only producer of EUV lithography machines. The new High NA model is designed to create smaller and more energy-efficient microchips, helping chipmakers boost performance and reduce power use.
The High NA machine began commercial use in 2024 at Intel’s manufacturing facility in Oregon. Building and delivering the machine involved sourcing parts from multiple countries and coordinating complex global logistics.
With improved resolution, the High NA model has already shown results. Major chipmakers like Intel, TSMC, and Samsung have reported strong performance gains using the new technology.
However, ASML is restricted from selling EUV machines to China due to U.S. export regulations. Instead, the company continues to supply China with its older Deep Ultraviolet (DUV) models.
Looking ahead, ASML plans to launch an even more advanced system, called Hyper NA, by 2035. It also aims to increase High NA production to meet growing global demand.
