Taiwan Semiconductor Manufacturing Company (TSMC) is currently assessing when to introduce ASML’s next-generation high-numerical aperture (high-NA) lithography machines into its chip production lines.
Each high-NA machine, developed by Dutch tech company ASML, carries a price tag of nearly $400 million. It is considered the most expensive piece of equipment used in semiconductor manufacturing.
TSMC Senior Vice President Zhang Wenhong said the company’s upcoming A14 node, along with its improved versions, does not urgently require high-NA lithography. He noted that TSMC is continuing to enhance the performance of its current low-NA extreme ultraviolet (EUV) lithography systems, which remain efficient for now.
In contrast, Intel plans to integrate high-NA lithography into its A14A process. This move is part of Intel’s strategy to boost its foundry business. Despite the shift, Intel will also continue using its older lithography systems.
ASML has announced that it expects high-NA lithography machines to begin mass production testing between 2026 and 2027. The company will deliver units to major chipmakers including TSMC, Intel, and Samsung.
TSMC has also made the decision not to use high-NA lithography for its future A16 node. The main reason, according to internal sources, is the steep cost of the equipment.
